Building the world’s most powerful Free Electron Lasers

We are on a mission to build and deploy particle accelerator driven Free Electron Lasers (FEL) for critical U.S. economic and national security applications.

Our work is driven by the belief that the United States must regain and sustain leadership in semiconductor manufacturing, starting with one of the industry’s most important chokepoints: Extreme Ultraviolet (EUV) Lithography.

We have designed – and are now building – the world’s most powerful FEL lasers to serve as a new light source for advanced EUV lithography. Our new source will replace the current Laser-Produced Plasma (LPP) source, which is nearing its physical limits.

Our systems will significantly enhance the technological roadmap of ASML – the undisputed global leader in EUV lithography systems – transform semiconductor fab capabilities and dramatically reduce capital and operating expenses.

All of that is enabled by our system’s brilliance, which far exceeds both today’s EUV light source and other similar light sources.

In short: xLight will enable U.S. leadership in the semiconductor industry of tomorrow. 

EUV Lithography Explained